旋转圆柱溅射阴极
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产品名称:
旋转圆柱溅射阴极
产品型号:
Onyx-RevolutionTM
产品展商:
利方达有限公司
简单介绍
安斯超科学（Angstrom Sciences）旋转圆柱溅射阴极：紧凑，经济，轻便，专利的磁场设计和水冷设计。提供10.6 °沉积剖面，85％以上的靶材利用以及相比，传统的圆柱磁控管省电高达20％，直径从3“到6”（76.2毫米到152.4毫米），长度可达154“（4米）。广泛用于平板显示，光伏、卷绕镀膜行业。
旋转圆柱溅射阴极的详细介绍
旋转圆柱溅射阴极技术规格：
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Cooling Requirements
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Flow Rate
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1 GPM Per 4 kW Power
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Maximum Input Temperature
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86 °F
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General
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Magnetic Enhancement
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Permanent (NdFeB) Encapsulated
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Maximum Temperature
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248 °F
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Mounting
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"O" -Ring Seal Flange
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Source to Substrate Distance
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2.000" - 12.000"
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Uniformity (Static)
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Adjustable to better than +/- 2%
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Maximum Sputtering Power *
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Cathode Voltage
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100 to 1500 Volts Continuous
3000 Strike
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Discharge Current
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300 Amps Maximum
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DC
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120 Kilowatts
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MF
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60 Kilowatts
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Target
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Cooling
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Direct / Indirect
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Diameter
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4" / 5" / 6"
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Fixation
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NW 50/60 Flange
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Form
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Cylindrical
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Specifications Disclaimer
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- All Angstrom Sciences NdFeB magnets are totally encapsulated and protected from degradation by water.
- * Maximum power for cathode only, a target material’s properties, such as, thermal and electrical conductivity may limit the maximum process power level.
- Specifications are subject to change without notice.
- Typical performance. Results may vary with process parameters such as pressure, flow rate, target material, and substrate rotation, etc.
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